|
Украина, 61108, Харьков, а/я 9410 тел: +38 057 755 0607,
тел: +38 050 302 7955 e-mail: iht@kharkov.ua, www.nano.org.ua |
Директор д.т.н., профессор, академик Академии технологических наук Украины |
Available deposition Methods
combination deposition methods "Hi-Tech"
Chemical vapour deposition methods (CVD and PECVD)
Vacuum arc coatings deposition
Filtered vacuum arc coatings deposition (FAD)
Magnetron sputtering
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Deposition methods |
Technological abilities |
Equipment |
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| CVD, PECVD |
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Vacuum arc including FAD (filtered arc deposition) |
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Ion beam and Plasma assisted |
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Диффузионное насыщение (siliconizing, boronizing and etc .) |
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Ionic saturation (ionic nitrcding, carburazing, oxidazing) |
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Implantation |
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Ion etching |
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Ion cleaning |
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Ion polishing |
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